Ferroelectric Dielectrics Integrated on Silicon

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Ferroelectric Dielectrics Integrated on Silicon

Emmanuel Defaÿ

Description

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films.

About the Author

Emmanuel Defaÿ has been involved at CEA LETI Minatec in piezoelectric and High-K dielectrics for 15 years. He has published 70 scientific papers, one book on piezoelectrics and worked with several top level microelectronics manufacturers (IBM, Freescale, ST). He is currently a lecturer at Ecole Centrale Paris and By-Fellow of Churchill College, Cambridge University, UK.

To Purchase this product, please visit

https://dev.store.wiley.com/en-ca/Ferroelectric+Dielectrics+Integrated+on+Silicon-p-9781848213135